Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...

New Portfolio Leapfrogs the Competition with Innovative Etch Techniques and Chemistries to Support Development of Advanced Logic and Memory Solutions As modern technologies and devices continue to ...

New systems enable precision materials engineering in high-aspect-ratio 3D logic and memory chip structures Centris™ Spectral™ SiN ALD leverages innovative microwave plasma technology to deliver ...

Researchers from Hanyang University have recently designed a three-dimensional (3D) microarray with dynamic chirality selection. Chirality is a non-superimposable property of structure; for example, ...

Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly half of all fab steps rely on ...

In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...

An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

Silicon nitride etch has been one of the foundations of semiconductor manufacturing for a number of years. Overall silicon (Si) etch rate is dictated by the combination of process temperature and H 2 ...

FREMONT, Calif., Feb. 09, 2022 (GLOBE NEWSWIRE) -- Lam Research Corp. (NASDAQ: LRCX) today announced a new suite of selective etch products that apply breakthrough wafer fabrication techniques and ...